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Analysis of propagation of a high-current electron beam from a sectioned plasma-filled diode


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

We report on the results of analysis of propagation of an electron beam from a plasma-filled diode in the absence of the metal anode between the regions of beam generation and transportation. The diode parameters are 160 kA, 400 kV, and 50 GW. At a distance exceeding 10 cm behind the generation region, a beam current of 100 kA to the target and an energy density of 20 J/cm2 are attained for the beam cross-sectional area of about 200 cm2. The possibility of varying the beam current and energy density by changing the distance to the target is demonstrated.

Авторлар туралы

A. Zherlitsyn

Institute of High Current Electronics

Хат алмасуға жауапты Автор.
Email: andzh@oit.hcei.tsc.ru
Ресей, Tomsk, 634055

B. Koval’chuk

Institute of High Current Electronics

Email: andzh@oit.hcei.tsc.ru
Ресей, Tomsk, 634055

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