Interaction between antimony atoms and micropores in silicon


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Abstract

The interaction between Sb atoms and micropores of a getter layer in silicon is studied. The getter layer was obtained via implantation of Sb+ ions into silicon and subsequent heat treatment processes. The antimony atoms located in the vicinity of micropores are captured by micropores during gettering annealing and lose its electrical activity. The activation energy of capture process to the pores for antimony is lower than that of antimony diffusion in silicon deformation fields around microvoids on the diffusion process.

About the authors

V. B. Odzhaev

Belarusian State University

Email: chelyadinski@bsu.by
Belarus, Minsk, 220030

A. N. Petlitskii

Integral

Email: chelyadinski@bsu.by
Belarus, Minsk

V. I. Plebanovich

Planar

Email: chelyadinski@bsu.by
Belarus, Minsk

P. K. Sadovskii

Belarusian State University

Email: chelyadinski@bsu.by
Belarus, Minsk, 220030

M. I. Tarasik

Belarusian State University

Email: chelyadinski@bsu.by
Belarus, Minsk, 220030

A. R. Chelyadinskii

Belarusian State University

Author for correspondence.
Email: chelyadinski@bsu.by
Belarus, Minsk, 220030

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