Interaction between antimony atoms and micropores in silicon
- Authors: Odzhaev V.B.1, Petlitskii A.N.2, Plebanovich V.I.3, Sadovskii P.K.1, Tarasik M.I.1, Chelyadinskii A.R.1
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Affiliations:
- Belarusian State University
- Integral
- Planar
- Issue: Vol 60, No 1 (2018)
- Pages: 20-22
- Section: Semiconductors
- URL: https://journals.rcsi.science/1063-7834/article/view/201836
- DOI: https://doi.org/10.1134/S1063783418010158
- ID: 201836
Cite item
Abstract
The interaction between Sb atoms and micropores of a getter layer in silicon is studied. The getter layer was obtained via implantation of Sb+ ions into silicon and subsequent heat treatment processes. The antimony atoms located in the vicinity of micropores are captured by micropores during gettering annealing and lose its electrical activity. The activation energy of capture process to the pores for antimony is lower than that of antimony diffusion in silicon deformation fields around microvoids on the diffusion process.
About the authors
V. B. Odzhaev
Belarusian State University
Email: chelyadinski@bsu.by
Belarus, Minsk, 220030
A. N. Petlitskii
Integral
Email: chelyadinski@bsu.by
Belarus, Minsk
V. I. Plebanovich
Planar
Email: chelyadinski@bsu.by
Belarus, Minsk
P. K. Sadovskii
Belarusian State University
Email: chelyadinski@bsu.by
Belarus, Minsk, 220030
M. I. Tarasik
Belarusian State University
Email: chelyadinski@bsu.by
Belarus, Minsk, 220030
A. R. Chelyadinskii
Belarusian State University
Author for correspondence.
Email: chelyadinski@bsu.by
Belarus, Minsk, 220030
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