Electron microscopy study of the microstructure of Ni–W substrate surface


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The surface microstructure of Ni–W alloy tapes, which are used as substrates to form films of high-temperature superconductors and photovoltaic devices, has been studied. Several samples of a Ni95W5 tape (Evico) annealed under different conditions were analyzed using scanning electron microscopy, energy-dispersive X-ray microanalysis, electron diffraction, and electron energy-loss spectroscopy. NiWO4 precipitates are found on the surface of annealed samples. The growth of precipitates at a temperature of 950°С is accompanied by the formation of pores on the surface or under an oxide film. Depressions with a wedge-shaped profile are found at the grain boundaries. Annealing in a reducing atmosphere using a specially prepared chamber allows one to form a surface free of nickel tungstate precipitates.

Sobre autores

A. Ovcharov

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

I. Karateev

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

A. Mikhutkin

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

A. Orekhov

Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 119333

M. Presniakov

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

I. Chernykh

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

M. Zanaveskin

National Research Centre “Kurchatov Institute,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182

M. Kovalchuk

National Research Centre “Kurchatov Institute,”; Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”

Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182; Moscow, 119333

A. Vasiliev

National Research Centre “Kurchatov Institute,”; Shubnikov Institute of Crystallography, Federal Scientific Research Centre “Crystallography and Photonics,”

Autor responsável pela correspondência
Email: a.vasiliev56@gmail.com
Rússia, Moscow, 123182; Moscow, 119333

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