Application of Two-Wavelength X-Ray Optical Scheme for Combined Measurements of X-Ray Specular Reflection and Diffuse Scattering to Study Multilayered Thin Film Structures
- Авторлар: Smirnov D.1,2, Gerasimenko N.1,2,3, Ovchinnikov V.4
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Мекемелер:
- National Research University of Electronic Technology MIET
- Lebedev Physical Institute
- Tomsk National Research State University
- Institute of Electrophysics, Ural Branch
- Шығарылым: Том 46, № 7 (2017)
- Беттер: 523-526
- Бөлім: Article
- URL: https://journals.rcsi.science/1063-7397/article/view/186703
- DOI: https://doi.org/10.1134/S1063739717070101
- ID: 186703
Дәйексөз келтіру
Аннотация
The complex study results of the parameters of TiN/Ti diffusion-barrier structures using the methods of relative X-ray reflectometry and diffuse scattering of X-ray radiation implemented by a two-wavelength X-ray optical measurement scheme are presented. It is shown that this scheme, by a single measurement, enables studying two different diffuse scattering regions, which increases the correctness and unambiguity of the analysis that was carried out. The considered complex of methods makes it possible to solve the ambiguity of a density/roughness type by the solution of the inverse reflectometry problem and to calculate the parameters of buried layers in the structures which were studied.
Авторлар туралы
D. Smirnov
National Research University of Electronic Technology MIET; Lebedev Physical Institute
Хат алмасуға жауапты Автор.
Email: rmta@miee.ru
Ресей, Moscow; Moscow
N. Gerasimenko
National Research University of Electronic Technology MIET; Lebedev Physical Institute; Tomsk National Research State University
Email: rmta@miee.ru
Ресей, Moscow; Moscow; Tomsk
V. Ovchinnikov
Institute of Electrophysics, Ural Branch
Email: rmta@miee.ru
Ресей, Ekaterinburg