Reflectometry technique for studying metal nanolayers on a substrate

A. V. Khomchenko; I. U. Primak; A. B. Sotsky; I. A. Korneeva; N. A. Krekatsen; A. N. Pyatlitski

doi:10.3103/S1062873816040195

Reflectometry technique for studying metal nanolayers on a substrate

作者: Khomchenko A.V.¹, Primak I.U.¹, Sotsky A.B.², Korneeva I.A.¹, Krekatsen N.A.³, Pyatlitski A.N.³
隶属关系:
1. Belarusian–Russian University
2. Kuleshov Mogilev State University
3. OAO Integral
期: 卷 80, 编号 4 (2016)
页面: 431-434
栏目: Proceedings of the XI Conference “Lasers and Laser Information Technologies: Fundamental Problems and Applications”
URL: https://journals.rcsi.science/1062-8738/article/view/184249
DOI: https://doi.org/10.3103/S1062873816040195
ID: 184249

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详细

A new noncontact technique is proposed for determining the parameters of nanosized metal coatings (absorption coefficients, refractive indices, and thicknesses). It is based on processing the measured angular dependence of the energy reflection coefficient of a polarized laser beam reflected by a thin-film structure surface. Features of determining the parameters of films on silicon substrates have been considered.