Reflectometry technique for studying metal nanolayers on a substrate

A. V. Khomchenko; I. U. Primak; A. B. Sotsky; I. A. Korneeva; N. A. Krekatsen; A. N. Pyatlitski

doi:10.3103/S1062873816040195

Reflectometry technique for studying metal nanolayers on a substrate

Autores: Khomchenko A.V.¹, Primak I.U.¹, Sotsky A.B.², Korneeva I.A.¹, Krekatsen N.A.³, Pyatlitski A.N.³
Afiliações:
1. Belarusian–Russian University
2. Kuleshov Mogilev State University
3. OAO Integral
Edição: Volume 80, Nº 4 (2016)
Páginas: 431-434
Seção: Proceedings of the XI Conference “Lasers and Laser Information Technologies: Fundamental Problems and Applications”
URL: https://journals.rcsi.science/1062-8738/article/view/184249
DOI: https://doi.org/10.3103/S1062873816040195
ID: 184249

Citar

Texto integral

Acesso aberto
Acesso é fechado

Acesso está concedido
Acesso é fechado

Somente assinantes

Resumo
Sobre autores
Bibliografia
Arquivos suplementares
Estatísticas

Resumo

A new noncontact technique is proposed for determining the parameters of nanosized metal coatings (absorption coefficients, refractive indices, and thicknesses). It is based on processing the measured angular dependence of the energy reflection coefficient of a polarized laser beam reflected by a thin-film structure surface. Features of determining the parameters of films on silicon substrates have been considered.