Optimizing the Parameters of Zr Alloy Doping with Al, Fe, and Mo via the Irradiation of Respective Films on Zr Surfaces Using Ar Ions

Resumo

The effect the sputtering of a film–substrate system has on the modification of near-surface layers of zirconium alloy E110 (Zr–1% Nb) in the ionic mixing regime upon irradiation by a beam of argon ions with a wide energy spectrum is considered. It is shown that to increase the atoms’ efficiency of penetration and achieve the optimum doping conditions via ionic mixing upon irradiation by a beam of ions with a broad energy spectrum, the ion energy in the beam must be increased while simultaneously lowering the reduced atomic beam mass by using a combined ion beam of different masses.