Enviar artigo por via de e-mail Factors Affecting the Operating Parameter of a Memristor Based on a LiF Thin Film with Cu Nanoclusters
- Autores: Lazareva T.S.1, Shchepina L.I.1, Chernykh A.A.1, Papernyi V.L.1, Ivanov N.A.2
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Afiliações:
- Research Institute of Applied Physics, Irkutsk State University
- Irkutsk National Research Technical University
- Edição: Volume 83, Nº 3 (2019)
- Páginas: 247-250
- Seção: Article
- URL: https://journals.rcsi.science/1062-8738/article/view/187306
- DOI: https://doi.org/10.3103/S1062873819030122
- ID: 187306
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Resumo
Factors affecting the operating parameter of a memristor (Roff/Ron) are considered. The increase in this parameter as the current of a magnetron and the period of irradiation are increased while preparing a LiF thin film with copper nanoclusters is studied. The synaptic behavior of a memristor based on this film is demonstrated.
Sobre autores
T. Lazareva
Research Institute of Applied Physics, Irkutsk State University
Email: schepina@api.isu.ru
Rússia, Irkutsk, 664003
L. Shchepina
Research Institute of Applied Physics, Irkutsk State University
Autor responsável pela correspondência
Email: schepina@api.isu.ru
Rússia, Irkutsk, 664003
A. Chernykh
Research Institute of Applied Physics, Irkutsk State University
Email: schepina@api.isu.ru
Rússia, Irkutsk, 664003
V. Papernyi
Research Institute of Applied Physics, Irkutsk State University
Email: schepina@api.isu.ru
Rússia, Irkutsk, 664003
N. Ivanov
Irkutsk National Research Technical University
Email: schepina@api.isu.ru
Rússia, Irkutsk, 664074
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