Factors Affecting the Operating Parameter of a Memristor Based on a LiF Thin Film with Cu Nanoclusters

T. S. Lazareva; L. I. Shchepina; A. A. Chernykh; V. L. Papernyi; N. A. Ivanov

doi:10.3103/S1062873819030122

Factors Affecting the Operating Parameter of a Memristor Based on a LiF Thin Film with Cu Nanoclusters

作者: Lazareva T.S.¹, Shchepina L.I.¹, Chernykh A.A.¹, Papernyi V.L.¹, Ivanov N.A.²
隶属关系:
1. Research Institute of Applied Physics, Irkutsk State University
2. Irkutsk National Research Technical University
期: 卷 83, 编号 3 (2019)
页面: 247-250
栏目: Article
URL: https://journals.rcsi.science/1062-8738/article/view/187306
DOI: https://doi.org/10.3103/S1062873819030122
ID: 187306

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详细

Factors affecting the operating parameter of a memristor (R_off/R_on) are considered. The increase in this parameter as the current of a magnetron and the period of irradiation are increased while preparing a LiF thin film with copper nanoclusters is studied. The synaptic behavior of a memristor based on this film is demonstrated.