Ion-plasma technologies for the preparation and modification of nanosized LiF layers

O. I. Shipilova; A. O. Khoroshikh; A. A. Kolomyltsev; A. A. Chernykh; V. L. Papernyj; N. A. Ivanov

doi:10.3103/S1062873816010196

Ion-plasma technologies for the preparation and modification of nanosized LiF layers

Autores: Shipilova O.I.¹, Khoroshikh A.O.¹, Kolomyltsev A.A.¹, Chernykh A.A.¹, Papernyj V.L.¹, Ivanov N.A.²
Afiliações:
1. Irkutsk State University
2. National Research State Technical University
Edição: Volume 80, Nº 1 (2016)
Páginas: 32-34
Seção: Proceedings of the XIV International Conference “Luminescence and Laser Physics”
URL: https://journals.rcsi.science/1062-8738/article/view/183546
DOI: https://doi.org/10.3103/S1062873816010196
ID: 183546

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The characteristics of LiF films containing Ag nanoparticles prepared via vacuum thermal deposition and magnetron sputtering, and then painted in microwave discharge plasma, are investigated. It is shown that simple and freely available ion-plasma technologies allow us to obtain nanosized LiF layers promising for use in photonics.