Ion-plasma technologies for the preparation and modification of nanosized LiF layers

O. I. Shipilova; A. O. Khoroshikh; A. A. Kolomyltsev; A. A. Chernykh; V. L. Papernyj; N. A. Ivanov

doi:10.3103/S1062873816010196

Ion-plasma technologies for the preparation and modification of nanosized LiF layers

作者: Shipilova O.I.¹, Khoroshikh A.O.¹, Kolomyltsev A.A.¹, Chernykh A.A.¹, Papernyj V.L.¹, Ivanov N.A.²
隶属关系:
1. Irkutsk State University
2. National Research State Technical University
期: 卷 80, 编号 1 (2016)
页面: 32-34
栏目: Proceedings of the XIV International Conference “Luminescence and Laser Physics”
URL: https://journals.rcsi.science/1062-8738/article/view/183546
DOI: https://doi.org/10.3103/S1062873816010196
ID: 183546

如何引用文章

全文:

开放存取

##reader.subscriptionAccessGranted##
受限制的访问

订阅存取

详细
作者简介
参考
补充文件
统计

详细

The characteristics of LiF films containing Ag nanoparticles prepared via vacuum thermal deposition and magnetron sputtering, and then painted in microwave discharge plasma, are investigated. It is shown that simple and freely available ion-plasma technologies allow us to obtain nanosized LiF layers promising for use in photonics.