Pulse laser deposition of vanadium dioxide films

O. A. Novodvorsky; L. S. Parshina; O. D. Khramova

doi:10.3103/S1062873816040262

Pulse laser deposition of vanadium dioxide films

Authors: Novodvorsky O.A.¹, Parshina L.S.¹, Khramova O.D.¹
Affiliations:
1. Institute of Laser and Information Technologies
Issue: Vol 80, No 4 (2016)
Pages: 376-380
Section: Proceedings of the XI Conference “Lasers and Laser Information Technologies: Fundamental Problems and Applications”
URL: https://journals.rcsi.science/1062-8738/article/view/184199
DOI: https://doi.org/10.3103/S1062873816040262
ID: 184199

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Abstract

Thin amorphous and crystalline films of VO₂ are obtained on (0001) sapphire substrates via pulsed laser deposition with the speed separation of particles under a variety of deposition conditions. The electrical and optical properties of the films in the vicinity of the phase transition in the temperature range of 20 to 100°C are studied. The temperature of transition (T_c) and the width of the hysteresis are found to be 67.5 and 3°C, respectively.