Pulse laser deposition of vanadium dioxide films

O. A. Novodvorsky; L. S. Parshina; O. D. Khramova

doi:10.3103/S1062873816040262

Pulse laser deposition of vanadium dioxide films

作者: Novodvorsky O.A.¹, Parshina L.S.¹, Khramova O.D.¹
隶属关系:
1. Institute of Laser and Information Technologies
期: 卷 80, 编号 4 (2016)
页面: 376-380
栏目: Proceedings of the XI Conference “Lasers and Laser Information Technologies: Fundamental Problems and Applications”
URL: https://journals.rcsi.science/1062-8738/article/view/184199
DOI: https://doi.org/10.3103/S1062873816040262
ID: 184199

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详细

Thin amorphous and crystalline films of VO₂ are obtained on (0001) sapphire substrates via pulsed laser deposition with the speed separation of particles under a variety of deposition conditions. The electrical and optical properties of the films in the vicinity of the phase transition in the temperature range of 20 to 100°C are studied. The temperature of transition (T_c) and the width of the hysteresis are found to be 67.5 and 3°C, respectively.