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Effect of irradiation on grain size and texture in Mo and Ta films
Andrianov V., Bedelbekova K.
Effect of isothermal annealing on the optical properties of Ca3TaGa3Si2O14 crystals
Deev G., Kozlova N., Zabelina E., Kasimova V., Pilyushko S., Buzanov O.
Complex Diagnostics of Silicon-on-Insulator Layers after Ion Implantation and Annealing
Yunin P., Drozdov M., Novikov A., Shmagin V., Demidov E., Mikhailov A., Tetelbaum D., Belov A.
Measurements of the Characteristics of Fine Grain Graphite Used as a First Wall Material for the T-15MD TOKAMAK
Begrambekov L., Puntakov N., Ayrapetov A., Grunin A., Dovganyuk S., Zakharov ., Savvin N., Grashin S., Arkhipov I.
Formation of Zn-Containing Clusters in Implanted Si3N4 Film
Tereshchenko A., Privezentsev V., Firsov A., Kulikauskas V., Zatekin V., Voronova M.
Effect of Annealing Conditions on the Formation of a Nanocrystalline Phase in TiOx Films
Nezhdanov A., Baratta M., De Filpo G., Markelov A., Andrianov A., Pavlov D., Ershov A., Skrylev A., Vinogradova L., Shestakov D., Zhukov A., Mashin A.
Optical Properties and Structure of In2O3 Films Deposited on Al2O3 (012) Substrates by dc-Magnetron Sputtering
Tikhii A., Nikolaenko Y., Svyrydova K., Zhikharev I.
Formation of Nanoclusters in Zinc-Implanted Crystalline Quartz
Privezentsev V., Firsov A., Kulikauskas V., Zatekin V., Tereshchenko A.
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