The effect of copper content on the formation of silicon suboxides phases in Cu–Si films obtained by ion-beam sputtering

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Abstract

Cu–Si systems are important for a wide range of technological applications. This work is devoted to the study of the influence of copper content on the formation of silicon oxide phases in Cu–Si films obtained by ion beam sputtering. According to X-ray diffraction and ultra-soft X-ray emission spectroscopy data in a film with a low copper content of ~15 wt. % silicon is partially in an amorphous state, and partially oxidized, forming a SiO0.47 suboxide. In films with a high copper content, Cu ~65 wt. % Cu3Si phase is formed, which leads to the formation of phases of SiO2 dioxide and SiO0.8 suboxide in both near-surface and deeper layers. X-ray photoelectron spectroscopy indicates the formation of predominantly silicon-oxygen tetrahedra of the Si-Si3O and SiO4 types for Cu ~15 wt. % and more oxygen-rich Si-Si2O2 silicon-oxygen tetrahedra for Cu ~65 wt. %, both on the surface and in deep layers of Cu–Si films.

About the authors

K. A. Barkov

Voronezh State University

Email: barkov@phys.vsu.ru
Voronezh 394018 Russian Federation

V. A. Terekhov

Voronezh State University

Voronezh 394018 Russian Federation

E. S. Kersnovsky

Voronezh State University

Voronezh 394018 Russian Federation

I. V. Polshin

Voronezh State University

Voronezh 394018 Russian Federation

S. A. Ivkov

Voronezh State University

Voronezh 394018 Russian Federation

A. I. Chukavin

Voronezh State University; Udmurt Federal Research Center of the Ural Branch of the Russian Academy of Sciences

Voronezh 394018 Russian Federation; Izhevsk, 426067 Russia

S. V. Rodivilov

Research Institute of Electronic Technology

Voronezh, 394033 Russia

N. S. Buylov

Voronezh State University; Research Institute of Electronic Technology

Voronezh 394018 Russian Federation; Voronezh, 394033 Russia

D. N. Nesterov

Voronezh State University

Voronezh 394018 Russian Federation

V. V. Pobedinsky

Voronezh State University; Research Institute of Electronic Technology

Voronezh 394018 Russian Federation; Voronezh, 394033 Russia

A. K. Pelagina

Voronezh State University

Voronezh 394018 Russian Federation

K. M. Moiseev

Voronezh State University; Bauman Moscow State Technical University

Voronezh 394018 Russian Federation; Moscow, 105005 Russia

A. E. Nikonov

Voronezh State Technical University

Voronezh, 394006 Russia

A. V. Sitnikov

Voronezh State Technical University

Voronezh, 394006 Russia

References

  1. Kammer C. Aluminum and aluminum alloys. // Springer Handbook of Materials Data. / Ed. Warlimont H., Martienssen W. Springer, 2018. P. 157. https://doi.org/10.1007/978-3-319-69743-7_6
  2. Parajuli O., Kumar N., Kipp D., Hahm J.I. // Appl. Phys. Lett. 2007. V. 90. P. 1. https://doi.org/10.1063/1.2730578
  3. Ahn H.J., Kim Y.S., Kim W.B., Sung Y.E., Seong T.Y. // J. Power Sources. 2006. V. 163 P. 211. https://doi.org/10.1016/j.jpowsour.2005.12.077
  4. Li H., Huang X., Chen L., Zhou G., Zhang Z., Yu D., Jun Mo Y., Pei N. // Solid State Ionics. 2000. V. 135. P. 181. https://doi.org/10.1016/S0167-2738(00)00362-3
  5. Su K., Luo J., Ji Y., Jiang X., Li J., Zhang J., Zhong Z., Su F.// J. Solid State Chem. 2021. V. 304. P. 122591. https://doi.org/10.1016/j.jssc.2021.122591
  6. Stolt L., Charai A., D’Heurle F.M., Fryer P.M., Harper J.M.E. // J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 1991. V. 9 P. 1501. https://doi.org/10.1116/1.577653
  7. Liu Y., Song S., Mao D., Ling H., Li M. // Microelectron. Eng. 2004. V. 75. P. 309. https://doi.org/10.1016/j.mee.2004.06.002
  8. An Z., Kamezawa C., Hirai M., Kusaka M., Iwami M. // J. Phys. Soc. Japan. 2002. V. 71. P. 2948. https://doi.org/10.1143/JPSJ.71.2948
  9. Wang J., Xu X., Ding C., Liu T., Dai Z., Qin H. // 2021 22nd Int. Conf. Electron. Packag. Technol. ICEPT. 2021. V. 1. P. 1. https://doi.org/10.1109/ICEPT52650.2021.9567953
  10. Somaiah N., Kanjilal A., Kumar P. // MRS Commun. 2020. V. 10. P. 164. https://doi.org/10.1557/mrc.2020.6
  11. Liu C.S., Chen L.J. // J. Appl. Phys. 1993. V. 74. P. 5501. https://doi.org/10.1063/1.354205
  12. Parditka B., Verezhak M., Balogh Z., Csik A., Langer G.A., Beke D.L., Ibrahim M., Schmitz G., Erdélyi Z. // Acta Mater. 2013. V. 61. P. 7173. https://doi.org/10.1016/j.actamat.2013.08.021
  13. Ibrahim M., Balogh-Michels Z., Stender P., Baither D., Schmitz G. // Acta Mater. 2016. V. 112. P. 315. https://doi.org/10.1016/j.actamat.2016.04.041
  14. Guillet S., Regalado L.E., Lopez-Rios T., Cinti R. // Appl. Surf. Sci. 1993. V. 65/66. P. 742. https://doi.org/10.1016/0169-4332(93)90748-Z
  15. Sufryd K., Ponweiser N., Riani P., Richter K.W., Cacciamani G. // Intermetallics. 2011. V. 19. P. 1479. https://doi.org/10.1016/j.intermet.2011.05.017
  16. Hallstedt B., Gröbner J., Hampl M., Schmid-Fetzer R. // Calphad Comput. Coupling Phase Diagrams Thermochem. 2016. V. 53. P. 25. https://doi.org/10.1016/j.calphad.2016.03.002
  17. Mattern N., Seyrich R., Wilde L., Baehtz C., Knapp M., Acker J. // J. Alloys Compd. 2007. V. 429. P. 211. https://doi.org/10.1016/j.jallcom.2006.04.046
  18. Chromik R.R., Neils W.K., Cotts E.J. // J. Appl. Phys. 1999. V. 86. P. 4273. https://doi.org/10.1063/1.371357
  19. Polat D.B., Eryilmaz L., Keleş Ö. // ECS Meet. Abstr. MA. 2014. P. 433. https://doi.org/10.1149/ma2014-02/5/433
  20. Polat B.D., Eryilmaz O.L., Keleş O., Erdemir A., Amine K., // Thin Solid Films. 2015. V. 596. P. 190. https://doi.org/10.1016/j.tsf.2015.09.085
  21. Sarkar D.K., Dhara S., Nair K.G.M., Chaudhury S.// Nucl. Instrum. Methods Phys. Res. B. 2000. V. 161. P. 992. https://doi.org/10.1016/S0168-583X(99)00774-0
  22. Gumarov A.I., Rogov A.M., Stepanov A.L. // Compos. Commun. 2020. V. 21 P. 8. https://doi.org/10.1016/j.coco.2020.100415
  23. Pászti Z., Petö G., Horváth Z.E., Karacs A., Guczi L. // J. Phys. Chem. B. 1997. V. 101. P. 2109. https://doi.org/10.1021/jp961490d
  24. Benouattas N., Mosser A., Raiser D., Faerber J., Bouabellou A. // Appl. Surf. Sci. 2000. V. 153. P. 79. https://doi.org/10.1016/S0169-4332(99)00366-9
  25. Benouattas N., Mosser A., Bouabellou A. // Appl. Surf. Sci. 2006. V. 252. P. 7572. https://doi.org/10.1016/j.apsusc.2005.09.010
  26. Saad A.M., Fedotov A.K., Fedotova J.A., Svito L.A., Andrievsky B.V., Kalinin Y.E., Fedotova V. V., Malyutina-Bronskaya V., Patryn A.A., Mazanik A.V., Sitnikov A.V. // Phys. Status Solidi C Conf. 2006. V. 3. P. 1283. https://doi.org/10.1002/pssc.200563111
  27. Svito I., Fedotov A.K.F., Koltunowicz T.N., Zukowski P., Kalinin Y., Sitnikov A., Czarnacka K., Saad A. // J. Alloys Compd. 2015. V. 615. P. S371. https://doi.org/10.1016/j.jallcom.2014.01.136
  28. Domashevskaya E.P., Mahdy M.A., Ivkov S.A., Sitnikov A.V., Mahdy I.A. // Mater. Chem. Phys. 2022. V. 277. P. 125480. https://doi.org/10.1016/j.matchemphys.2021.125480
  29. Terekhov V.A., Domashevskaya E.P., Kurganskii S.I., Nesterov D.N., Barkov K.A., Radina V.R., Velichko K.E., Zanin I.E., Sitnikov A.V., Agapov B.L. // Thin Solid Films. 2023. P. 772. P. 139816. https://doi.org/10.1016/j.tsf.2023.139816
  30. Ситников А.В. // Альтернативная энергетика и экология. 2003. № S2. P. 114.
  31. Agarwal B.K. X-Ray Spectroscopy. // Springer Series in Optical Sciences. / Springer Berlin, Heidelberg, 1991. P. 421. https://doi.org/10.1007/978-3-662-14469-5
  32. Зимкина Т.М., Фомичев В.А. Ультрамягкая рентгеновская спектроскопия. / Ред. Порай-Кошиц Е.А. Изд-во Ленинградского университета, 1971. С. 132.
  33. Terekhov V.A., Kashkarov V.M., Manukovskii E.Yu., Schukarev A.V., Domashevskaya E.P. // J. Electron Spectros. Relat. Phenomena. 2001. V. 114–116. P. 895. https://doi.org/10.1016/S0368-2048(00)00393-5
  34. Zimmermann P., Peredkov S., Abdala P.M., De Beer S., Tromp M., Müller C., van Bokhoven J.A. // Coord. Chem. Rev. 2020. V. 423. P. 213466. https://doi.org/10.1016/j.ccr.2020.213466
  35. Baker A.D., Brundle C.R. Electron Spectroscopy: Theory, Experiments and Applications. Academic Press, 1978. P. 361.
  36. Hufner S. Photoelctron Spectroscopy: Principles and Applications. // Springer Series in Solid-State Sciences. V. 82. / Ed. Lotsch K.V. Springer Science & Business Media, 2013. P. 515. https://doi.org/10.1007/978-3-662-03150-6
  37. Himpsel F.J., McFeely F.R., Taleb-Ibrahimi A., Yarmoff J.A., Hollinger G. // Phys. Rev. B. 1988. V. 38. P. 6084. https://doi.org/10.1103/PhysRevB.38.6084
  38. Joint Committee on Powder Diffraction Standards (JCPDS) (2024) International Centre for Diffraction Data, USA. https://www.icdd.com/
  39. Solberg J.K. // Acta Crystallogr. Sect. A. 1978. V. 34. P. 684–698. https://doi.org/10.1107/S0567739478001448.
  40. Wiech G., Feldhütter H.O., Šimůnek A. // Phys. Rev. B. 1993. V. 47. P. 6981. https://doi.org/10.1103/PhysRevB.47.6981.
  41. Moulder J.F. Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of XPS Data / Ed. Chastain J. Physical Electronics Division, Perkin-Elmer Corporation, 1992. P. 261.
  42. Fang D., He F., Xie J., Xue L. // J. Wuhan Univ. Technol. Mater. Sci. Ed. 2020. V. 35. P. 711. https://doi.org/10.1007/s11595-020-2312-7.
  43. Banholzer W.F., Burrell M.C. // Surf. Sci. 1986. V. 176. P. 125. https://doi.org/10.1016/0039-6028(86)90167-6.
  44. Hollinger G., Himpsel F.J. // J. Vac. Sci. Technol. A Vacuum, Surfaces, Film. 1983. V. 1 P. 640. https://doi.org/10.1116/1.572199.
  45. Huang H.Y., Chen L.J. // Appl. Phys. Lett. 2000. V. 88. P. 1412. https://doi.org/10.1063/1.373832

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