Microstructure and Density of Mo Films in Multilayer Mo/Si Mirrors


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Resumo

Using the wide-angle and small-angle X-ray diffraction techniques, the Mo density is obtained as a function of the layer thickness in periodic X-ray Mo/Si mirrors synthesized by magnetron sputtering in an argon atmosphere. By the example of a simulated aperiodic multilayer Mo/Si mirror, the necessity to take into account the real density of Mo and the incorrect use of its tabulated densities is demonstrated.

Sobre autores

Yu. Vainer

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

S. Garakhin

Institute for Physics of Microstructures, Russian Academy of Sciences

Autor responsável pela correspondência
Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

V. Polkovnikov

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

N. Salashchenko

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

M. Svechnikov

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

N. Chkhalo

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

P. Yunin

Institute for Physics of Microstructures, Russian Academy of Sciences

Email: garakhins@yandex.ru
Rússia, Nizhny Novgorod, 607680

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