Morphology of anodic alumina films obtained by hard anodization: Influence of the rate of anodization voltage increase
- Авторы: Roslyakov I.V.1,2,3, Kuratova N.S.1, Koshkodaev D.S.4, Merino D.H.5, Lukashin A.V.1,2,3, Napolskii K.S.1,2,3
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Учреждения:
- Department of Materials Science
- Department of Chemistry
- Foundation “National Intellectual Development”
- National Research University of Electronic Technology
- DUBBLE CRG ESRF BM26
- Выпуск: Том 10, № 1 (2016)
- Страницы: 191-197
- Раздел: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/188051
- DOI: https://doi.org/10.1134/S1027451016010298
- ID: 188051
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Аннотация
The influence of the anodization voltage ramp on the morphology and thickness homogeneity of porous anodic alumina films was studied. The samples were prepared in the oxalic acid at 120 V during the hard anodization process. As a nondestructive characterization method, the smallangle Xray scattering technique was used. The analysis of diffraction patterns allows determining the mean value and dispersion of interpore distance and the channel tortuosity with high accuracy. The increase of voltage ramp at the initial stage of hard anodization process was shown to lead to reduction of mechanical deformation (tortuosity) of anodic alumina film during crystallization.
Об авторах
I. Roslyakov
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Автор, ответственный за переписку.
Email: ilya.roslyakov@gmail.ru
Россия, Moscow, 119991; Moscow, 119991; Moscow, 119991
N. Kuratova
Department of Materials Science
Email: ilya.roslyakov@gmail.ru
Россия, Moscow, 119991
D. Koshkodaev
National Research University of Electronic Technology
Email: ilya.roslyakov@gmail.ru
Россия, Zelenograd, Moscow, 124498
D. Merino
DUBBLE CRG ESRF BM26
Email: ilya.roslyakov@gmail.ru
Франция, Grenoble Cedex, F-38043
A. Lukashin
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Email: ilya.roslyakov@gmail.ru
Россия, Moscow, 119991; Moscow, 119991; Moscow, 119991
K. Napolskii
Department of Materials Science; Department of Chemistry; Foundation “National Intellectual Development”
Email: ilya.roslyakov@gmail.ru
Россия, Moscow, 119991; Moscow, 119991; Moscow, 119991
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