Energy Threshold of the Atomic and Cluster Sputtering of Some Elements under Bombardment with Cs, Rb, and Na Ions


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The results obtained using secondary-ion mass spectrometry under the bombardment of Si(111) crystals are analyzed. It is shown that, as bombarding ion masses are increased in the case of the same energy, the relative yield of cluster ions and the threshold cluster sputtering energy increase with increasing number n; n is the number of atoms in the cluster (n = 1–5). The threshold sputtering energies are determined for atoms and clusters. The experimental data on the threshold particle sputtering energies are compared with the data of molecular-dynamics simulation.

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R. Djabbarganov

Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences

编辑信件的主要联系方式.
Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125

B. Atabaev

Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences

Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125

Z. Isakhanov

Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences

Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125

U. Sharopov

Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences

Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125

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