Energy Threshold of the Atomic and Cluster Sputtering of Some Elements under Bombardment with Cs, Rb, and Na Ions
- 作者: Djabbarganov R.1, Atabaev B.G.1, Isakhanov Z.A.1, Sharopov U.B.1
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隶属关系:
- Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences
- 期: 卷 13, 编号 4 (2019)
- 页面: 640-643
- 栏目: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/196384
- DOI: https://doi.org/10.1134/S1027451019040049
- ID: 196384
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详细
The results obtained using secondary-ion mass spectrometry under the bombardment of Si(111) crystals are analyzed. It is shown that, as bombarding ion masses are increased in the case of the same energy, the relative yield of cluster ions and the threshold cluster sputtering energy increase with increasing number n; n is the number of atoms in the cluster (n = 1–5). The threshold sputtering energies are determined for atoms and clusters. The experimental data on the threshold particle sputtering energies are compared with the data of molecular-dynamics simulation.
作者简介
R. Djabbarganov
Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences
编辑信件的主要联系方式.
Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125
B. Atabaev
Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences
Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125
Z. Isakhanov
Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences
Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125
U. Sharopov
Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences
Email: utkirstar@gmail.com
乌兹别克斯坦, Tashkent, 100125
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