Dislocation glide in GaN films grown by the lateral-overgrowth method induced by low-energy electron-beam irradiation
- Autores: Yakimov E.B.1, Vergeles P.S.1
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Afiliações:
- Institute of Microelectronics Technology and High Purity Materials
- Edição: Volume 10, Nº 5 (2016)
- Páginas: 959-961
- Seção: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/189683
- DOI: https://doi.org/10.1134/S1027451016050177
- ID: 189683
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Resumo
The effect of irradiation on the dislocation structure of epitaxial GaN films, grown by the lateral-overgrowth method, is studied using the electron-beam-induced current mode in a scanning electron microscope. Low-energy electron-beam irradiation is found to lead to the gliding basal-plane dislocations even at very low excitation levels. Changes in the relative contrast of two segments of adjacent basal-plane dislocations may also indicate dislocation movement in the prismatic planes.
Sobre autores
E. Yakimov
Institute of Microelectronics Technology and High Purity Materials
Autor responsável pela correspondência
Email: Yakimov@iptm.ru
Rússia, Chernogolovka, Moscow oblast, 142432
P. Vergeles
Institute of Microelectronics Technology and High Purity Materials
Email: Yakimov@iptm.ru
Rússia, Chernogolovka, Moscow oblast, 142432
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