Investigation of the surface-potential distribution of epitaxial CdHgTe films
- Authors: Novikov V.A.1, Grigoryev D.V.1, Voitsekhovskii A.V.1, Dvoretsky S.A.2, Mikhailov N.N.2
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Affiliations:
- Tomsk State University
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Issue: Vol 10, No 5 (2016)
- Pages: 1096-1100
- Section: Article
- URL: https://journals.rcsi.science/1027-4510/article/view/190135
- DOI: https://doi.org/10.1134/S1027451016050372
- ID: 190135
Cite item
Abstract
The epitaxial growth of CdHgTe films is accompanied by the formation of V defects whose density and electronic properties greatly affect the characteristics of a terminal device based on the given material. Scanning atomic-force microscopy techniques are proposed to investigate how electronic properties vary in the V-defect region of an epitaxial CdHgTe film. It is experimentally demonstrated that variations in the component composition of individual crystallites generating V defects create not only the complex spatial distribution of a potential field but also a potential barrier along the crystallite periphery. The given barrier must alter the charge-carrier exchange between crystallites, appreciably changing the current distribution over the V-defect area.
About the authors
V. A. Novikov
Tomsk State University
Author for correspondence.
Email: novikovvadim@mail.ru
Russian Federation, Tomsk, 634050
D. V. Grigoryev
Tomsk State University
Email: novikovvadim@mail.ru
Russian Federation, Tomsk, 634050
A. V. Voitsekhovskii
Tomsk State University
Email: novikovvadim@mail.ru
Russian Federation, Tomsk, 634050
S. A. Dvoretsky
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: novikovvadim@mail.ru
Russian Federation, Novosibirsk, 630090
N. N. Mikhailov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: novikovvadim@mail.ru
Russian Federation, Novosibirsk, 630090
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