Broadband Spontaneous and Stimulated Luminescence of Heavily Doped AlxGa1 – xN Structures
- Authors: Bokhan P.A.1, Zhuravlev K.S.1, Zakrevsky D.E.1,2, Malin T.V.1, Osinnykh I.V.1, Fateev N.V.1,3
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Affiliations:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Novosibirsk State Technical University
- Novosibirsk State University
- Issue: Vol 31, No 4 (2018)
- Pages: 405-409
- Section: Optical Sources and Receivers for Environmental Studies
- URL: https://journals.rcsi.science/1024-8560/article/view/188474
- DOI: https://doi.org/10.1134/S1024856018040048
- ID: 188474
Cite item
Abstract
The spectral characteristics of spontaneous and stimulated luminescence of heavily silicon-doped AlxGa1 – xN structures with the concentration nSi > 1020 cm–3 are studied with pulsed optical pumping at λ = 266 nm. The resulting dominant broadband radiation with a full width at half maximum of ~150 nm covers the whole visible spectral region. The radiation spectrum from the end of the structure is split into narrow components determined by the mode structure of the planar waveguide formed. The results indicate the stimulated character of the radiation. The optical gain for different structures fall in the range 20–70 cm–1.
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About the authors
P. A. Bokhan
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Author for correspondence.
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
K. S. Zhuravlev
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
D. E. Zakrevsky
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State Technical University
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630073
T. V. Malin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
I. V. Osinnykh
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
N. V. Fateev
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: bokhan@isp.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630090
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