Predicting Microdistribution of Metal Electrodeposition Rate from Electrolytes with Positive and Negative Leveling Power
- 作者: Kruglikov S.S.1, Titova N.V.2, Nekrasova N.E.1, Kruglikova E.S.3, Telezhkina A.V.1, Brodskii V.A.1, Kolesnikov V.A.1, Gubin A.F.1
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隶属关系:
- Mendeleev University of Chemical Technology
- Sechenov First State Medical University
- Moscow Polytechnical University
- 期: 卷 54, 编号 12 (2018)
- 页面: 1195-1200
- 栏目: Article
- URL: https://journals.rcsi.science/1023-1935/article/view/190268
- DOI: https://doi.org/10.1134/S1023193518140045
- ID: 190268
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详细
The relationship between the leveling power of electrolytes, the primary current distribution, and the microdistribution of the metal deposition rate is considered. For electrolytes with positive, zero, and negative leveling power, the calculations of microdistribution of metal deposition rate are carried out with regard to the data on the primary current distribution obtained experimentally for a macromodel of the microprofile under study. Good agreement is demonstrated between the microdistribution calculated using the described method and the results of direct measurements of metal distribution over the surface with the regular twodimensional microprofile.
作者简介
S. Kruglikov
Mendeleev University of Chemical Technology
编辑信件的主要联系方式.
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
N. Titova
Sechenov First State Medical University
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 119991
N. Nekrasova
Mendeleev University of Chemical Technology
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
E. Kruglikova
Moscow Polytechnical University
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 107023
A. Telezhkina
Mendeleev University of Chemical Technology
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
V. Brodskii
Mendeleev University of Chemical Technology
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
V. Kolesnikov
Mendeleev University of Chemical Technology
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
A. Gubin
Mendeleev University of Chemical Technology
Email: skruglikov@mail.ru
俄罗斯联邦, Moscow, 125047
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