Predicting Microdistribution of Metal Electrodeposition Rate from Electrolytes with Positive and Negative Leveling Power

Abstract

The relationship between the leveling power of electrolytes, the primary current distribution, and the microdistribution of the metal deposition rate is considered. For electrolytes with positive, zero, and negative leveling power, the calculations of microdistribution of metal deposition rate are carried out with regard to the data on the primary current distribution obtained experimentally for a macromodel of the microprofile under study. Good agreement is demonstrated between the microdistribution calculated using the described method and the results of direct measurements of metal distribution over the surface with the regular twodimensional microprofile.