Preparing Thin Gallium Sulphide Films via PECVD and Studying Their Properties
- Авторлар: Mochalov L.1, Kudryashov M.2, Logunov A.1,2, Vshivtsev M.2, Prokhorov I.2, Vorotyntsev V.2, Malyshev V.2, Sazanova T.2,3, Kudryashova Y.1, Bulanov E.1, Knyazev A.1
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Мекемелер:
- Lobachevsky University
- Nizhny Novgorod State Technical University
- Mendeleev University of Chemical Technology
- Шығарылым: Том 97, № 1 (2023)
- Беттер: 148-154
- Бөлім: ФИЗИЧЕСКАЯ ХИМИЯ ДИСПЕРСНЫХ СИСТЕМ И ПОВЕРХНОСТНЫХ ЯВЛЕНИЙ
- URL: https://journals.rcsi.science/0044-4537/article/view/136541
- DOI: https://doi.org/10.31857/S0044453723010211
- EDN: https://elibrary.ru/BCQPAV
- ID: 136541
Дәйексөз келтіру
Аннотация
Thin films of GaSх are obtained via plasma-enhanced chemical vapor deposition (PECVD) for the first time, while high-purity volatile derivatives of the corresponding macrocomponents (gallium chloride (GaCl3) and hydrogen sulfide (H2S)) are used as the initial materials. It is found that the nonequilibrium low-temperature plasma of an HF discharge (40.68 MHz) at a reduced pressure (0.01 Torr) is the initiator of chemical transformations. Components of reactive plasma formed in the gas phase are studied via optical emission spectroscopy (OES). Structural and electrophysical properties of the obtained materials are studied as well.
Негізгі сөздер
Авторлар туралы
L. Mochalov
Lobachevsky University
Email: knyazevav@gmail.com
603022, Nizhny Novgorod, Russia
M. Kudryashov
Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia
A. Logunov
Lobachevsky University; Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603022, Nizhny Novgorod, Russia; 603155, Nizhny Novgorod, Russia
M. Vshivtsev
Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia
I. Prokhorov
Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia
V. Vorotyntsev
Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia
V. Malyshev
Nizhny Novgorod State Technical University
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia
T. Sazanova
Nizhny Novgorod State Technical University; Mendeleev University of Chemical Technology
Email: knyazevav@gmail.com
603155, Nizhny Novgorod, Russia; 125047, Moscow, Russia
Yu. Kudryashova
Lobachevsky University
Email: knyazevav@gmail.com
603022, Nizhny Novgorod, Russia
E. Bulanov
Lobachevsky University
Email: knyazevav@gmail.com
603022, Nizhny Novgorod, Russia
A. Knyazev
Lobachevsky University
Хат алмасуға жауапты Автор.
Email: knyazevav@gmail.com
603022, Nizhny Novgorod, Russia
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