Formation of an Electrode Deposit under Galvanostatic Conditions
- Authors: Isaev V.A.1, Grishenkova O.V.1, Laptev M.V.1, Isakov A.V.1, Zaikov Y.P.1
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Affiliations:
- Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
- Issue: Vol 2018, No 8 (2018)
- Pages: 763-766
- Section: Article
- URL: https://journals.rcsi.science/0036-0295/article/view/172065
- DOI: https://doi.org/10.1134/S0036029518080086
- ID: 172065
Cite item
Abstract
The laws of formation of a continuous deposit layer at a given direct current are considered. Equations are analyzed to calculate the time dependences of overpotential for instantaneous nucleation with kinetic or diffusion control of new-phase growth. The calculated dependences are compared with the experimental ones obtained for silicon electrodeposition from a fluoride–chloride melt.
About the authors
V. A. Isaev
Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
Author for correspondence.
Email: v.isaev@ihte.uran.ru
Russian Federation, Yekaterinburg, 620137
O. V. Grishenkova
Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
Email: v.isaev@ihte.uran.ru
Russian Federation, Yekaterinburg, 620137
M. V. Laptev
Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
Email: v.isaev@ihte.uran.ru
Russian Federation, Yekaterinburg, 620137
A. V. Isakov
Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
Email: v.isaev@ihte.uran.ru
Russian Federation, Yekaterinburg, 620137
Yu. P. Zaikov
Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of Sciences
Email: v.isaev@ihte.uran.ru
Russian Federation, Yekaterinburg, 620137
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