Method for stepped etching of optical glass fibers
- Authors: Vasil’ev M.G.1, Vasil’ev A.M.1, Golovanov V.V.1, Izotov A.D.1, Shelyakin A.A.1
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Affiliations:
- Kurnakov Institute of General and Inorganic Chemistry
- Issue: Vol 61, No 9 (2016)
- Pages: 1160-1162
- Section: Physical Methods of Investigation
- URL: https://journals.rcsi.science/0036-0236/article/view/166768
- DOI: https://doi.org/10.1134/S0036023616090205
- ID: 166768
Cite item
Abstract
A method for stepped etching of optical glass fibers using various compositions of etching agents based on a 40% hydrofluoric acid (HF) and aqueous solutions of ammonium fluoride (NH4F) has been considered. Compositions, etching rates, the dependence of etching rate on temperature, and tyeh dependence of etching forms on composition have been determined. The potential use of the method for stepped etching of optical glass fibers in the manufacture of microelectronic devices has been demonstrated.
About the authors
M. G. Vasil’ev
Kurnakov Institute of General and Inorganic Chemistry
Author for correspondence.
Email: mgvas@igic.ras.ru
Russian Federation, Leninskii pr. 31, Moscow, 119991
A. M. Vasil’ev
Kurnakov Institute of General and Inorganic Chemistry
Email: mgvas@igic.ras.ru
Russian Federation, Leninskii pr. 31, Moscow, 119991
V. V. Golovanov
Kurnakov Institute of General and Inorganic Chemistry
Email: mgvas@igic.ras.ru
Russian Federation, Leninskii pr. 31, Moscow, 119991
A. D. Izotov
Kurnakov Institute of General and Inorganic Chemistry
Email: mgvas@igic.ras.ru
Russian Federation, Leninskii pr. 31, Moscow, 119991
A. A. Shelyakin
Kurnakov Institute of General and Inorganic Chemistry
Email: mgvas@igic.ras.ru
Russian Federation, Leninskii pr. 31, Moscow, 119991
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