Amorphous SICX:H and SICXNY:H films obtained from hexamethyldisilane vapor in inductively coupled RF discharge plasma
- Авторлар: Chagin M.N.1, Ermakova E.N.1, Shayapov V.R.1, Sulyaeva V.S.1, Maksimovskii E.A.1, Yushina I.V.1, Kosinova M.L.1
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Мекемелер:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
- Шығарылым: Том 58, № 6 (2024)
- Беттер: 500-507
- Бөлім: PLASMA CHEMISTRY
- URL: https://journals.rcsi.science/0023-1193/article/view/281565
- DOI: https://doi.org/10.31857/S0023119324060112
- EDN: https://elibrary.ru/THFVPG
- ID: 281565
Дәйексөз келтіру
Аннотация
Amorphous films of hydrogenated silicon carbide SiCx:H and carbonitride SiCxNy:H have been synthesized in an RF inductively coupled plasma reactor using hexamethyldisilane vapor and additional argon and/or nitrogen gases. The deposition process was carried out at temperatures of 50–400°C and plasma powers of 100–400 W. The dependences of the growth rate, chemical composition and structure of films, light transmittance, refractive index, and optical band gap on synthesis conditions have been obtained. An in situ study of the gas phase composition was performed using optical emission spectroscopy.
Толық мәтін

Авторлар туралы
M. Chagin
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
E. Ermakova
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
V. Shayapov
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
V. Sulyaeva
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
E. Maksimovskii
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
I. Yushina
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
M. Kosinova
Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: marina@niic.nsc.ru
Ресей, Novosibirsk
Әдебиет тізімі
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