Мақаланы E-mail арқылы жіберу Development of a Kinetic Model for the Direct Oxidation of Benzene to Phenol by Oxygen in Dielectric Barrier Discharge
- Авторлар: Ochered’ko A.1, Leshchik A.1, Kudryashov S.1, Ryabov A.1
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Мекемелер:
- Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
- Шығарылым: Том 57, № 5 (2023)
- Беттер: 396-399
- Бөлім: ПЛАЗМОХИМИЯ
- URL: https://journals.rcsi.science/0023-1193/article/view/140011
- DOI: https://doi.org/10.31857/S002311932305008X
- EDN: https://elibrary.ru/MYBAOH
- ID: 140011
Дәйексөз келтіру
Ашық рұқсат
Рұқсат берілді
Тек жазылушылар үшін
Аннотация
A simplified model of the process of benzene oxidation by oxygen in a dielectric barrier discharge has been developed. A kinetic scheme of oxidation is proposed that reflects the real chemistry of the process. The simulation results confirm the earlier assumptions about the main stages of the benzene oxidation process with oxygen.
Негізгі сөздер
Авторлар туралы
A. Ochered’ko
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
A. Leshchik
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
S. Kudryashov
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
A. Ryabov
Institute of Petroleum Chemistry, Siberian Branch, Russian Academy of Sciences
Хат алмасуға жауапты Автор.
Email: andrew@ipc.tsc.ru
Tomsk, 634055 Russia
Әдебиет тізімі
- Fridman A. Plasma chemistry. New York: Cambridge University Press, 2012. 978 p.
- Самойлович В.Г., Гибалов В.И., Козлов К.В. Физическая химия барьерного разряда. Москва: МГУ, 1989. 174 с.
- Kogelschatz U. // Plasma Chem. Plasma P. 2003. V. 23. № 1. P. 1.
- Кудряшов С.В., Рябов А.Ю., Сироткина Е.Е. и др. // Химия высоких энергий. 2003. Т. 37. № 3. С. 220.
- Kudryashov S., Ryabov A., Shchyogoleva G. // J. Phys. D. Appl. Phys. 2016. V. 49. P. 025205.
- Ochered’ko A.N., Kudryashov S.V., Ryabov A.Yu., et al. // High Energ. Chem. 2022. V. 56. № 4. P. 284.
- Kraus M., Egli W., Haffner K., et al. // Phys. Chem. Chem. Phys. 2002. V. 4. № 4. P. 668.
- Lovascio S., Blin-Simiand N., Magne L., et al. // Plasma Chem. Plasma P. 2015. V. 35. № 2. P. 279–301.
- Istadi I., Amin N.A.S. // Chem. Eng. Sci. 2007. V. 62. № 23. P. 6568.
- Yang Y. // Plasma Chem. Plasma P. 2003. V. 23. № 2. P. 283.
- Non-thermal plasma techniques for pollution control / ed. Penetrante B.M., Schultheis S.E. Berlin, Heidelberg: Springer Berlin Heidelberg, 1993. 421 p.
- Viehland database. URL: http://www.lxcat.net (дата обращения 25.04.2023).
- Bugaev S.P., Kozyrev A.V., Kuvshinov V.A., et al. // Plasma chem. Plasma P. 1998. V. 18. № 2. P. 247.
- Kovács T. // Plasma Ñhem. Plasma P. 2009. V. 30. № 1. P. 207.
- Hagelaar G.J.M., Pitchford L.C. // Plasma Sources Sci. T. 2005. V. 14. № 4. P. 722.
- Kintecus. URL: www.kintecus.org. (дата обращения: 25.04.2023).
- Taatjes C.A., Osborn D. L., Selby T.M., et al. // J. Phys. Chem. A. 2010. V. 114. № 9. P. 3355.
- Tanaka K., Ando M., Sakamoto Y., et al. // Int. J. Chem. Kinet. 2012. V. 44. P. 41.
- Atkinson R., Baulch D.L., Cox R.A., et al. // Atmos. Chem. Phys. 2004. V. 4. № 6. P. 1461.
- Turányi T., Nagy T., Zsély I.G., et al. // Int. J. Chem. Kinet. 2012. V. 44. № 5. P. 284.
- Atkinson R., Baulch D.L., Cox R.A., et al. // J. Phys. Chem. Ref. Data. 1989. V. 18. № 2. P. 881.
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