Atomic Rearrangements and Photoemission Processes at a p-GaN(Cs)–Vacuum Interface
- Авторы: Bakin V.V.1, Kosolobov S.N.1, Rozhkov S.A.1,2, Scheibler H.E.1,2, Terekhov A.S.1
-
Учреждения:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Novosibirsk State University
- Выпуск: Том 108, № 3 (2018)
- Страницы: 180-184
- Раздел: Optics and Laser Physics
- URL: https://journals.rcsi.science/0021-3640/article/view/161213
- DOI: https://doi.org/10.1134/S0021364018150031
- ID: 161213
Цитировать
Аннотация
Spontaneous changes in photoemission properties of a р-GaN(Cs)–vacuum interface with effective negative electronic affinity induced by rearrangements of its atomic structure have been studied for the first time. The optimum Сs coating that ensures both the maximum photoelectron escape probability and its stability has been found. A thermodynamic model has been proposed to escape the relation of the photoemission properties of the р-GaN(Cs)–vacuum interface to its free energy and entropy.
Об авторах
V. Bakin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: terek@isp.nsc.ru
Россия, Novosibirsk, 630090
S. Kosolobov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: terek@isp.nsc.ru
Россия, Novosibirsk, 630090
S. Rozhkov
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: terek@isp.nsc.ru
Россия, Novosibirsk, 630090; Novosibirsk, 630090
H. Scheibler
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: terek@isp.nsc.ru
Россия, Novosibirsk, 630090; Novosibirsk, 630090
A. Terekhov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Автор, ответственный за переписку.
Email: terek@isp.nsc.ru
Россия, Novosibirsk, 630090
Дополнительные файлы
