Atomic Rearrangements and Photoemission Processes at a p-GaN(Cs)–Vacuum Interface
- Авторлар: Bakin V.V.1, Kosolobov S.N.1, Rozhkov S.A.1,2, Scheibler H.E.1,2, Terekhov A.S.1
-
Мекемелер:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Novosibirsk State University
- Шығарылым: Том 108, № 3 (2018)
- Беттер: 180-184
- Бөлім: Optics and Laser Physics
- URL: https://journals.rcsi.science/0021-3640/article/view/161213
- DOI: https://doi.org/10.1134/S0021364018150031
- ID: 161213
Дәйексөз келтіру
Аннотация
Spontaneous changes in photoemission properties of a р-GaN(Cs)–vacuum interface with effective negative electronic affinity induced by rearrangements of its atomic structure have been studied for the first time. The optimum Сs coating that ensures both the maximum photoelectron escape probability and its stability has been found. A thermodynamic model has been proposed to escape the relation of the photoemission properties of the р-GaN(Cs)–vacuum interface to its free energy and entropy.
Авторлар туралы
V. Bakin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: terek@isp.nsc.ru
Ресей, Novosibirsk, 630090
S. Kosolobov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: terek@isp.nsc.ru
Ресей, Novosibirsk, 630090
S. Rozhkov
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: terek@isp.nsc.ru
Ресей, Novosibirsk, 630090; Novosibirsk, 630090
H. Scheibler
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: terek@isp.nsc.ru
Ресей, Novosibirsk, 630090; Novosibirsk, 630090
A. Terekhov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Хат алмасуға жауапты Автор.
Email: terek@isp.nsc.ru
Ресей, Novosibirsk, 630090
Қосымша файлдар
