Electrical Properties of High-Quality Synthetic Boron-Doped Diamond Single Crystals and Schottky Barrier Diodes on Their Basis


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Resumo

The temperature dependences of the specific resistance and Hall coefficient of high-quality synthetic boron-doped diamond single crystals grown via a high-pressure high-temperature method are studied. The concentration of acceptors in the (001) cut plates was varied in a range of 2 × 1015–3 × 1017 cm–3 by varying the concentration of boron in the growth mixture (0.0004–0.04 at %). Thin rectangular plates with the uniform concentration of boron and free from extended structural defects are cut out by a laser after the X-ray topography and mapping of UV luminescence. The concentrations of donors and acceptors in the samples are calculated from the data of the Hall effect and capacitance–voltage characteristics. The obtained results correlate with the concentration of boron in the growth mixture. The minimum compensation ratio of acceptors with donors (below 1%) is observed in the crystals grown with the concentration of boron in the growth mixture of 0.002 at %. The ratio increases when the amount of boron is increased or decreased. The samples grown at such a concentration of boron have the maximum mobility of charge carriers (2200 cm2/(V s) at T = 300 K and 7200 cm2/(V s) at T = 180 K). The phonon scattering of holes dominates throughout the range of temperatures (180–800 K), while the scattering by point defects (neutral and ionized atoms of the impurity) is insignificant. The diamond crystals which are grown from a mixture containing 0.0005–0.002 at % boron and have perfect quality and a lattice mechanism of scattering can be considered as a reference semiconductor.

Sobre autores

V. Bormashov

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

S. Terent’ev

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

N. Luparev

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

D. Teteruk

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

N. Kornilov

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

M. Kuznetsov

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

A. Golovanov

Technological Institute for Superhard and Novel Carbon Materials; Moscow Institute of Physics and Technology, Dolgoprudnyi

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190; Moscow, 141701

A. Volkov

Technological Institute for Superhard and Novel Carbon Materials

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190

S. Buga

Technological Institute for Superhard and Novel Carbon Materials; Moscow Institute of Physics and Technology, Dolgoprudnyi

Autor responsável pela correspondência
Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190; Moscow, 141701

S. Tarelkin

Technological Institute for Superhard and Novel Carbon Materials; Moscow Institute of Physics and Technology, Dolgoprudnyi

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190; Moscow, 141701

V. Blank

Technological Institute for Superhard and Novel Carbon Materials; Moscow Institute of Physics and Technology, Dolgoprudnyi

Email: bug@tisnum.ru
Rússia, TroitskMoscow, 142190; Moscow, 141701

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