Behavior of Some Refractory Hafnium and Tantalum Compounds in Plasma Flows


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Abstract

By reacting tantalum or hafnium carbide with iridium in the presence of a small amount of silicon, we have prepared refractory hafnium- and tantalum-containing materials consisting of a mixture of phases: the intermetallic compound MIr3, recrystallized tantalum or hafnium carbide, and iridium silicide. We have studied the behavior of the materials during an exposure to a high-speed plasma flow at a sample surface temperature of 2000°C and demonstrated that, owing to their special microstructure, the absence of pores, and the low oxidation rate of the iridium-containing components, they exhibit a good ablation resistance and that the hafnium system withstands a longer exposure.

About the authors

N. I. Baklanova

Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch, Russian Academy of Sciences

Email: lozanov.25@gmail.com
Russian Federation, ul. Kutateladze 18, Novosibirsk, 630128

V. V. Lozanov

Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch, Russian Academy of Sciences

Author for correspondence.
Email: lozanov.25@gmail.com
Russian Federation, ul. Kutateladze 18, Novosibirsk, 630128

A. A. Kul’kov

Central Research Institute for Special Machinery Joint Stock Company

Email: lozanov.25@gmail.com
Russian Federation, Zavodskaya ul., Khotkovo, Moscow oblast, 141371

E. A. Antipov

Central Research Institute for Special Machinery Joint Stock Company

Email: lozanov.25@gmail.com
Russian Federation, Zavodskaya ul., Khotkovo, Moscow oblast, 141371

A. T. Titov

Sobolev Institute of Geology and Mineralogy, Siberian Branch, Russian Academy of Sciences

Email: lozanov.25@gmail.com
Russian Federation, pr. Akademika Koptyuga 3, Novosibirsk, 630090

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