Characteristic Features of Multilayer Photonic Bandgap Fiber Fabrication

Abstract

We have demonstrated a modified chemical vapor deposition (MCVD) process for the fabrication of multilayer photonic bandgap fiber based on high-purity silica glass. Sequential growth of layers differing in melting point has been shown to lead to distortion of the layers in the resulting photonic bandgap structure and a sharp rise in optical loss as a result of deviations from Bragg’s reflection conditions. By optimizing the chemical composition of the layers in the photonic bandgap structure, we were able to suppress excessive optical losses and reach the optical loss limit, which is only determined by the guidance properties of the photonic bandgap structure itself.