Effect of methyltrimethoxysilane hydrolysis and condensation conditions on the properties of thin polymethylsilsesquioxane films


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Abstract

We have studied the influence of methyltrimethoxysilane hydrolysis and condensation conditions in aprotic solvents on the formation, composition, and properties of thin polymethylsilsesquioxane films. The condensation of silanol groups and the structuring of the silicon–oxygen skeleton at different heat-treatment temperatures have been investigated by IR spectroscopy. The dielectric permittivity k and refractive index n of the films have been determined as functions of annealing temperature ta: at ta = 430°C, k = 2.75 and n = 1.38.

About the authors

R. N. Nenashev

Moscow Technological University (MIREA)

Author for correspondence.
Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454

N. M. Kotova

Moscow Technological University (MIREA)

Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454

A. S. Vishnevskii

Moscow Technological University (MIREA)

Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454

K. A. Vorotilov

Moscow Technological University (MIREA)

Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454

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