Effect of methyltrimethoxysilane hydrolysis and condensation conditions on the properties of thin polymethylsilsesquioxane films
- Authors: Nenashev R.N.1, Kotova N.M.1, Vishnevskii A.S.1, Vorotilov K.A.1
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Affiliations:
- Moscow Technological University (MIREA)
- Issue: Vol 52, No 6 (2016)
- Pages: 625-629
- Section: Article
- URL: https://journals.rcsi.science/0020-1685/article/view/157713
- DOI: https://doi.org/10.1134/S0020168516060108
- ID: 157713
Cite item
Abstract
We have studied the influence of methyltrimethoxysilane hydrolysis and condensation conditions in aprotic solvents on the formation, composition, and properties of thin polymethylsilsesquioxane films. The condensation of silanol groups and the structuring of the silicon–oxygen skeleton at different heat-treatment temperatures have been investigated by IR spectroscopy. The dielectric permittivity k and refractive index n of the films have been determined as functions of annealing temperature ta: at ta = 430°C, k = 2.75 and n = 1.38.
About the authors
R. N. Nenashev
Moscow Technological University (MIREA)
Author for correspondence.
Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454
N. M. Kotova
Moscow Technological University (MIREA)
Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454
A. S. Vishnevskii
Moscow Technological University (MIREA)
Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454
K. A. Vorotilov
Moscow Technological University (MIREA)
Email: nenashev@mirea.ru
Russian Federation, pr. Vernadskogo 78, Moscow, 119454
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