Сrystallinity and size control of silicon nanoparticles synthesized from monosilane in glow-discharge plasma
- Autores: Ashurov R.K.1, Turdaliev T.K.1, Ashurov I.K.1, Rotshteyn V.M.1
-
Afiliações:
- Arifov Institute of Ion–Plasma and Laser Technologies
- Edição: Volume 53, Nº 4 (2017)
- Páginas: 334-337
- Seção: Solar Engineering Materials Science
- URL: https://journals.rcsi.science/0003-701X/article/view/149353
- DOI: https://doi.org/10.3103/S0003701X17040028
- ID: 149353
Citar
Resumo
Decomposition reaction of monosilane in glow discharge plasma of both direct (DC) and alternating current (AC) have been performed. The possibility of nanosilicon synthesis using the glow discharge plasma has been shown. The Raman spectroscopy is applied to study the phase composition and granulometric analysis of the obtained nanosilicon samples. The possibility of the structure and size control of amorphous silicon films with nano crystalline inclusions (a-Si:H/c-Si + nc-Si) by varying pressure and composition of a gas mixture in the process of synthesis has been demonstrated.
Sobre autores
R. Ashurov
Arifov Institute of Ion–Plasma and Laser Technologies
Autor responsável pela correspondência
Email: ashurovkhatam01@gmail.com
Uzbequistão, Tashkent, 100125
T. Turdaliev
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
Uzbequistão, Tashkent, 100125
I. Ashurov
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
Uzbequistão, Tashkent, 100125
V. Rotshteyn
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
Uzbequistão, Tashkent, 100125
Arquivos suplementares
