Сrystallinity and size control of silicon nanoparticles synthesized from monosilane in glow-discharge plasma
- 作者: Ashurov R.K.1, Turdaliev T.K.1, Ashurov I.K.1, Rotshteyn V.M.1
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隶属关系:
- Arifov Institute of Ion–Plasma and Laser Technologies
- 期: 卷 53, 编号 4 (2017)
- 页面: 334-337
- 栏目: Solar Engineering Materials Science
- URL: https://journals.rcsi.science/0003-701X/article/view/149353
- DOI: https://doi.org/10.3103/S0003701X17040028
- ID: 149353
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详细
Decomposition reaction of monosilane in glow discharge plasma of both direct (DC) and alternating current (AC) have been performed. The possibility of nanosilicon synthesis using the glow discharge plasma has been shown. The Raman spectroscopy is applied to study the phase composition and granulometric analysis of the obtained nanosilicon samples. The possibility of the structure and size control of amorphous silicon films with nano crystalline inclusions (a-Si:H/c-Si + nc-Si) by varying pressure and composition of a gas mixture in the process of synthesis has been demonstrated.
作者简介
R. Ashurov
Arifov Institute of Ion–Plasma and Laser Technologies
编辑信件的主要联系方式.
Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125
T. Turdaliev
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125
I. Ashurov
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125
V. Rotshteyn
Arifov Institute of Ion–Plasma and Laser Technologies
Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125
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