Сrystallinity and size control of silicon nanoparticles synthesized from monosilane in glow-discharge plasma


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Decomposition reaction of monosilane in glow discharge plasma of both direct (DC) and alternating current (AC) have been performed. The possibility of nanosilicon synthesis using the glow discharge plasma has been shown. The Raman spectroscopy is applied to study the phase composition and granulometric analysis of the obtained nanosilicon samples. The possibility of the structure and size control of amorphous silicon films with nano crystalline inclusions (a-Si:H/c-Si + nc-Si) by varying pressure and composition of a gas mixture in the process of synthesis has been demonstrated.

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R. Ashurov

Arifov Institute of Ion–Plasma and Laser Technologies

编辑信件的主要联系方式.
Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125

T. Turdaliev

Arifov Institute of Ion–Plasma and Laser Technologies

Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125

I. Ashurov

Arifov Institute of Ion–Plasma and Laser Technologies

Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125

V. Rotshteyn

Arifov Institute of Ion–Plasma and Laser Technologies

Email: ashurovkhatam01@gmail.com
乌兹别克斯坦, Tashkent, 100125

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