Formation of an Array of Memristor Structures Using a Self-Assembly Matrix of Porous Anodic Aluminum Oxide


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In this paper we demonstrate a technological route for the formation of an array of memristor structures using a self-assembly matrix of porous anodic aluminum oxide. We propose using a porous alumina matrix as a solid mask to develop pores in the dense silicon oxide layer below the mask, in which a material characterized by the possibility of resistive switching is formed. The merit of this mask should include reproducibility and the high-precision control of geometric parameters of the pores. The current-voltage characteristics of a memristor structure based on solid electrolyte Cu2S are determined.

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A. Belov

National Research University of Electronic Technology

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Email: nanointech@mail.ru
俄罗斯联邦, Moscow, 124498

A. Golishnikov

National Research University of Electronic Technology

Email: nanointech@mail.ru
俄罗斯联邦, Moscow, 124498

M. Kislitsin

National Research University of Electronic Technology

Email: nanointech@mail.ru
俄罗斯联邦, Moscow, 124498

A. Perevalov

National Research University of Electronic Technology

Email: nanointech@mail.ru
俄罗斯联邦, Moscow, 124498

A. Solnyshkin

Tver State University

Email: nanointech@mail.ru
俄罗斯联邦, Tver, 170100

V. Shevyakov

National Research University of Electronic Technology

Email: nanointech@mail.ru
俄罗斯联邦, Moscow, 124498

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