Luminescence in GeOx films containing germanium nanoclusters
- 作者: Astankova K.N.1, Gorokhov E.B.1, Volodin V.A.1,2, Marin D.V.1, Azarov I.A.1, Latyshev A.V.1,2
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隶属关系:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Novosibirsk State University
- 期: 卷 11, 编号 5-6 (2016)
- 页面: 325-330
- 栏目: Article
- URL: https://journals.rcsi.science/2635-1676/article/view/219346
- DOI: https://doi.org/10.1134/S1995078016030046
- ID: 219346
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详细
Metastable GeOx films have been deposited onto a Si substrate by the electron beam evaporation of GeO2 powder in high vacuum. The optical properties of Ge nanoclusters in GeOx films after a series of annealing are studied by Raman spectroscopy, ellipsometry, cathodoluminescence, and photoluminescence. After the annealings, the cathodoluminescence peaks are first found in GeOx films in the visible spectral range (400 and 660 nm) at room temperature. The cathodoluminescence may be associated both with the existence of nonground (excited) levels in Ge nanoclusters and allowed optical transitions from an excited to ground level and surface states at Ge/GeO2-matrix interface or defects inside a Ge nanocluster. The photoluminescence signals in a yellow-green region (2.1–2.4 eV), which are observed for GeOx films after annealings, can be explained by quasi-direct optical transitions in Ge nanoclusters.
作者简介
K. Astankova
Rzhanov Institute of Semiconductor Physics, Siberian Branch
编辑信件的主要联系方式.
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090
E. Gorokhov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090
V. Volodin
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090; ul. Pirogova 2, Novosibirsk, 630090
D. Marin
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090
I. Azarov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090
A. Latyshev
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: as-tankoff@ya.ru
俄罗斯联邦, pr. Akad. Lavrentieva 13, Novosibirsk, 630090; ul. Pirogova 2, Novosibirsk, 630090
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