Study of the Effect of Laser Radiation on the Parameters of Alumina Films Formed by Atomic Layer Deposition
- Autores: Dedkova A.A.1, Dyuzhev N.A.1, Kireev V.Y.1, Klemente I.E.2, Myakon’kikh A.V.2, Rudenko K.V.2
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Afiliações:
- National Research University of Electronic Technology
- Valiev Institute of Physics and Technology, Russian Academy of Sciences
- Edição: Volume 13, Nº 9-10 (2018)
- Páginas: 502-507
- Seção: Functional Nanomaterials
- URL: https://journals.rcsi.science/2635-1676/article/view/220638
- DOI: https://doi.org/10.1134/S199507801805004X
- ID: 220638
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Resumo
The effect of laser radiation with a wavelength of 970 nm and a power density of 0.29–2.10 W/cm2 on the process of atomic layer deposition of alumina films from precursors (trimethylaluminium + water vapor) is studied. Laser irradiation is performed at the stages of reactor purging after the introduction of precursors. The results of a comprehensive analysis involving spectral ellipsometry, atomic force microscopy, X-ray diffractometry, and secondary-ion mass spectrometry have revealed that laser irradiation (i) does not alter the rate of deposition of alumina films onto silicon slices; (ii) does not alter the surface relief (roughness) of alumina films; (iii) does not alter the depth profile of the chemical composition of alumina films; (iv) reduces the average density of irradiated regions of alumina films by 5–10% relative to the density of nonirradiated regions.
Sobre autores
A. Dedkova
National Research University of Electronic Technology
Email: valerikireev@mail.ru
Rússia, MoscowZelenograd, 124498
N. Dyuzhev
National Research University of Electronic Technology
Email: valerikireev@mail.ru
Rússia, MoscowZelenograd, 124498
V. Kireev
National Research University of Electronic Technology
Autor responsável pela correspondência
Email: valerikireev@mail.ru
Rússia, MoscowZelenograd, 124498
I. Klemente
Valiev Institute of Physics and Technology, Russian Academy of Sciences
Email: valerikireev@mail.ru
Rússia, Moscow, 117218
A. Myakon’kikh
Valiev Institute of Physics and Technology, Russian Academy of Sciences
Email: valerikireev@mail.ru
Rússia, Moscow, 117218
K. Rudenko
Valiev Institute of Physics and Technology, Russian Academy of Sciences
Email: valerikireev@mail.ru
Rússia, Moscow, 117218
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