Deposition of multicomponent filmlike coating on metal substrate using plasma focus device

Resumo

Results of the investigation of multicomponent coating deposition on the metal substrate in the cathode part of a dense plasma focus device are presented. The features of the processes accompanying the coating are considered: evaporation of elements of chromium-manganese austenite 25Cr12Mn20W tube, which was located along the axis of the plasma focus PF-1000 chamber, under high temperature dense deuterium plasma and deposition of the elements on the model material in form of a copper arc. It is shown that, in the realized exposure mode (the power density of the plasma flow q_p = 10⁸–10⁹ W/cm² in the zone of its impact on the tube and q_p = 10⁶ W/cm² in the region of interaction of the plasma with the copper substrate), the proposed method makes it possible to obtain a coating of submicron thickness on the substrate surface, which includes the evaporated elements of the steel tube. The combined action of powerful streams of fast deuterons and hot plasma in the central part of the copper arc was examined. The structural state, elemental composition, mechanical characteristics, and possible mechanisms for hardening of the deposited film coating are discussed.