DC Magnetron Sputtering Plasma: VUV Radiation and Discharge Structure

Cover Page

Cite item

Full Text

Abstract

The results of studies on DC magnetron discharge plasma carried out in the framework of RFBR project 18-29-27001 are presented. The structure of the magnetron discharge was investigated using the PIC MC method at pressures of 1–10 mTorr and a discharge current of 0.5 A. It was shown that the cathode region, where almost all of the discharge voltage drops, consists of a thin cathode sheath (0.1–0.2 mm) and a wide presheath (~2 cm), where most of the ionization occur. The ratio of voltages dropping in the sheath and the presheath linearly increases with pressure. The dependence of the discharge voltage on gas pressure has a minimum around 3 mTorr. At pressures of 2–12 mTorr, the intensity of vacuum ultraviolet (VUV) radiation was measured. On a substrate located 10 cm from the cathode, it is of the order of 1015 photons/(cm2s) at a deposition rate of 1.5 nm/s. The intensity is proportional to the discharge current and decreases with pressure. Estimates of the degree of damage to the porous low-k dielectric by VUV radiation during the deposition of barrier layers in a magnetron discharge were obtained.

About the authors

Alexander F. Pal

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Author for correspondence.
Email: apal@mics.msu.su
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Alexey N. Ryabinkin

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: alex.ryabinkin@gmail.com
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Alexander O. Serov

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: aserov@mics.msu.su
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Dmitriy V. Lopaev

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: d.lopaev@gmail.com
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Yuriy A. Mankelevich

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: ymankelevich@mics.msu.ru
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Alexander T. Rakhimov

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: arakhimov@mics.msu.ru

Professor

Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

Tatyana V. Rakhimova

Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Email: trakhimova@mics.msu.ru
Russian Federation, 1-2 Leninskie Gory, GSP-1, Moscow, 119991, Russia

References

  1. P. Kelly, R. Arnell Vacuum, 2000, 56(3), 159. doi: 10.1016/S0042-207X(99)00189-X.
  2. U. Helmersson, M. Lattemann, J. Bohlmark, A.P. Ehiasarian, J.T. Gudmundsson Thin Solid Films, 2006, 513(1–2), 1. doi: 10.1016/j.tsf.2006.03.033.
  3. A.F. Pal, A.N. Ryabinkin, A.O. Serov, D.V. Lopaev, Y.A. Mankelevich, A.T. Rakhimov, T.V. Rakhimova, M.R. Baklanov J. Phys. D. Appl. Phys., 2020, 53(29), 295202. doi: 10.1088/1361-6463/ab813f.
  4. J.W. Bradley, S. Thompson, Y.A. Gonzalvo Plasma Sources Sci. Technol., 2001, 10(3), 490. doi: 10.1088/0963-0252/10/3/314.
  5. O. Baranov, M. Romanov, M. Wolter, S. Kumar, X. Zhong, K. Ostrikov Phys. Plasmas, 2010, 17(5), 053509. doi: 10.1063/1.3431098.
  6. C. Huo, D. Lundin, M.A. Raadu, A. Anders, J.T. Gudmundsson, N. Brenning Plasma Sources Sci. Technol., 2013, 22(4), 045005. doi: 10.1088/0963-0252/22/4/045005.
  7. N. Brenning, J.T. Gudmundsson, D. Lundin, T. Minea, M.A. Raadu, U. Helmersson Plasma Sources Sci. Technol., 2016, 25(6), 065024. doi: 10.1088/0963-0252/25/6/065024.
  8. S. Kondo, K. Nanbu J. Vac. Sci. Technol. A Vacuum, Surfaces, Film., 2001, 19(3), 830. doi: 10.1116/1.1359534.
  9. I. Kolev, A. Bogaerts, R. Gijbels Phys. Rev. E., 2005, 72(5), 056402. doi: 10.1103/PhysRevE.72.056402.
  10. I. Kolev, A. Bogaerts IEEE Trans. Plasma Sci., 2006, 34(3), 886. doi: 10.1109/TPS.2006.875843.
  11. E. Bultinck, A. Bogaerts J. Phys. D. Appl. Phys., 2008, 41(20), 202007. doi: 10.1088/0022-3727/41/20/202007.
  12. A. Revel, T. Minea, C. Costin Plasma Sources Sci. Technol., 2018, 27(10), 105009. doi: 10.1088/1361-6595/aadebe.
  13. S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, T. Tatsumi J. Appl. Phys., 2008, 103(7), 073303. doi: 10.1063/1.2891787.
  14. H. Shi, H. Huang, J. Bao, J. Liu, P.S. Ho, Y. Zhou, J.T. Pender, M.D. Armacost, D. Kyser J. Vac. Sci. Technol. B, 2012, 30(1), 011206. doi: 10.1116/1.3671008.
  15. T.V. Rakhimova, A.T. Rakhimov, Y.A. Mankelevich, D.V. Lopaev, A.S. Kovalev, A.N. Vasileva, O.V. Proshina, O.V. Braginsky, S.M. Zyryanov, K. Kurchikov, N.N. Novikova, M.R. Baklanov Appl. Phys. Lett., 2013, 102(11), 111902. doi: 10.1063/1.4795792.
  16. T.V. Rakhimova, A.T. Rakhimov, Y.A. Mankelevich, D.V. Lopaev, A.S. Kovalev, A.N. Vasil’eva, S.M. Zyryanov, K. Kurchikov, O.V. Proshina, D.G. Voloshin, N.N. Novikova, M.B. Krishtab, M.R. Baklanov J. Phys. D. Appl. Phys., 2014, 47(2), 025102. doi: 10.1088/0022-3727/47/2/025102.
  17. A.N. Ryabinkin, A.O. Serov, A.F. Pal, Y.A. Mankelevich, A.T. Rakhimov, T.V. Rakhimova Plasma Sources Sci. Technol. IOP Publishing, 2021, 30(5), 055009. doi: 10.1088/1361-6595/abf31e.
  18. Y.A. Mankelevich, A.F. Pal, A.N. Ryabinkin, A.O. Serov J. Phys. Conf. Ser., 2018, 946(1), 012150. doi: 10.1088/1742-6596/946/1/012150.
  19. NIST Atomic Spectra Database (https://physics.nist.gov/asd). doi: 10.18434/T4W30F.
  20. S. Espinho, E. Felizardo, J. Henriques, E. Tatarova J. Appl. Phys., 2017, 121(15), 153303. doi: 10.1063/1.4981535.

Supplementary files

Supplementary Files
Action
1. JATS XML
Download

Copyright (c) 2023 Pal A.F., Ryabinkin A.N., Serov A.O., Lopaev D.V., Mankelevich Y.A., Rakhimov A.T., Rakhimova T.V.

Согласие на обработку персональных данных

 

Используя сайт https://journals.rcsi.science, я (далее – «Пользователь» или «Субъект персональных данных») даю согласие на обработку персональных данных на этом сайте (текст Согласия) и на обработку персональных данных с помощью сервиса «Яндекс.Метрика» (текст Согласия).