Studying the composition and structure of films obtained by thermal oxidation of copper

Abstract

The composition and structure of copper oxide thin films obtained by thermal oxidation of copper layers with a thickness of 100 nm, deposited onto quartz glass by high-frequency magnetron sputtering, have been studied. The dependences of the film thickness and content of CuO and Cu₂O oxides in it on the temperature–time conditions of thermal treatment are obtained. The studies have shown that depending on the preparation modes, the films can be multiphase and contain different copper oxides, predominantly, CuO and Cu₂O, which possess different bandgaps and p-type conductivity.