Spectrophotometric differential kinetic method for the determination of germanium and silicon in the presence of each other in the GeO2–SiO2 systems

Abstract

The spectrophotometric differential kinetic method of determination of silicon and germanium based on a difference in the kinetic parameters in the presence of each other the same analytical form in GeO₂–SiO₂ systems is described. The possibility of the development of analytical techniques taking into account the revealed limitations of the proposed kinetic scheme is shown. The studies of the model solutions show that the margin of analytical error does not exceed the acceptable limit for the applied method.