High-Sensitive Two-Layer Photoresistors Based on p-CdxHg1–xTe with a Converted Near-Surface Layer
- Authors: Ismailov N.D.1, Talipov N.K.2, Voitsekhovskii A.V.3
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Affiliations:
- Institute of Physics, Azerbaijan National Academy of Sciences
- Peter the Great Military Academy of Strategic Rocket Forces
- National Research Tomsk State University
- Issue: Vol 60, No 12 (2018)
- Pages: 2186-2192
- Section: Article
- URL: https://journals.rcsi.science/1064-8887/article/view/239876
- DOI: https://doi.org/10.1007/s11182-018-1344-3
- ID: 239876
Cite item
Abstract
The results of an experimental study of photoelectric characteristics of two-layer photoresistors based on р-CdxHg1–xTe (x = 0.24−0.28) with a thin near-surface layer of n-type obtained by treatment in atmospheric gas plasma are presented. It is shown that the presence of a potential barrier between the p- and n-regions causes high photosensitivity and speed of operation of such photoresistors at T = 77 K
About the authors
N. D. Ismailov
Institute of Physics, Azerbaijan National Academy of Sciences
Author for correspondence.
Email: ismailovnamik@yahoo.com
Azerbaijan, Baku
N. Kh. Talipov
Peter the Great Military Academy of Strategic Rocket Forces
Email: ismailovnamik@yahoo.com
Russian Federation, Balashikha
A. V. Voitsekhovskii
National Research Tomsk State University
Email: ismailovnamik@yahoo.com
Russian Federation, Tomsk
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