High-Sensitive Two-Layer Photoresistors Based on p-CdxHg1–xTe with a Converted Near-Surface Layer


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Abstract

The results of an experimental study of photoelectric characteristics of two-layer photoresistors based on р-CdxHg1–xTe (x = 0.24−0.28) with a thin near-surface layer of n-type obtained by treatment in atmospheric gas plasma are presented. It is shown that the presence of a potential barrier between the p- and n-regions causes high photosensitivity and speed of operation of such photoresistors at T = 77 K

About the authors

N. D. Ismailov

Institute of Physics, Azerbaijan National Academy of Sciences

Author for correspondence.
Email: ismailovnamik@yahoo.com
Azerbaijan, Baku

N. Kh. Talipov

Peter the Great Military Academy of Strategic Rocket Forces

Email: ismailovnamik@yahoo.com
Russian Federation, Balashikha

A. V. Voitsekhovskii

National Research Tomsk State University

Email: ismailovnamik@yahoo.com
Russian Federation, Tomsk

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