Cumulation of a High-Current Electron Beam During a Nanosecond High-Voltage Discharge in a Low-Pressure Diode
- 作者: Lomaev M.I.1,2, Tarasenko V.F.1,2, Dyatlov A.V.2
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隶属关系:
- Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences
- National Research Tomsk Polytechnic University
- 期: 卷 62, 编号 6 (2019)
- 页面: 996-1000
- 栏目: Article
- URL: https://journals.rcsi.science/1064-8887/article/view/241943
- DOI: https://doi.org/10.1007/s11182-019-01806-9
- ID: 241943
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详细
The results of an experimental investigation of the effect of cumulation of a beam of runaway electrons formed in a high-voltage nanosecond discharge at a reduced air pressure are presented. The optimal conditions of this effect in a discharge gap in a tubular cathode – grounded planar anode geometry were achieved at an air pressure of ≈5 Pa and an interelectrode gap of 2.75 mm. An electron-beam current pulse is recorded with a high time resolution (up to about 80 ps) behind the flat foil anode. It is found out that due to this effect a through hole is formed in a 20 μm-thick aluminum foil after 2–3 discharge pulses. The results obtained suggest that the electron energy in the second part of the beam current pulse is lower than that in its first part.
作者简介
M. Lomaev
Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences; National Research Tomsk Polytechnic University
编辑信件的主要联系方式.
Email: lomaev@loi.hcei.tsc.ru
俄罗斯联邦, Tomsk; Tomsk
V. Tarasenko
Institute of High Current Electronics of the Siberian Branch of the Russian Academy of Sciences; National Research Tomsk Polytechnic University
Email: lomaev@loi.hcei.tsc.ru
俄罗斯联邦, Tomsk; Tomsk
A. Dyatlov
National Research Tomsk Polytechnic University
Email: lomaev@loi.hcei.tsc.ru
俄罗斯联邦, Tomsk
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