Synthesis of Highly Oriented Zinc-Oxide Films on Amorphous Substrates by the Method of Direct-Current Magnetron Sputtering
- Autores: Ismailov A.1, Emiraslanova L.1, Rabadanov M.1, Rabadanov M.1, Aliev I.1
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Afiliações:
- Dagestan State University
- Edição: Volume 44, Nº 6 (2018)
- Páginas: 528-531
- Seção: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/207734
- DOI: https://doi.org/10.1134/S1063785018060202
- ID: 207734
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Resumo
We describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.
Sobre autores
A. Ismailov
Dagestan State University
Autor responsável pela correspondência
Email: egdada@mail.ru
Rússia, Makhachkala, Dagestan, 367000
L. Emiraslanova
Dagestan State University
Email: egdada@mail.ru
Rússia, Makhachkala, Dagestan, 367000
M. Rabadanov
Dagestan State University
Email: egdada@mail.ru
Rússia, Makhachkala, Dagestan, 367000
M. Rabadanov
Dagestan State University
Email: egdada@mail.ru
Rússia, Makhachkala, Dagestan, 367000
I. Aliev
Dagestan State University
Email: egdada@mail.ru
Rússia, Makhachkala, Dagestan, 367000