Synthesis of Highly Oriented Zinc-Oxide Films on Amorphous Substrates by the Method of Direct-Current Magnetron Sputtering
- Authors: Ismailov A.M.1, Emiraslanova L.L.1, Rabadanov M.K.1, Rabadanov M.R.1, Aliev I.S.1
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Affiliations:
- Dagestan State University
- Issue: Vol 44, No 6 (2018)
- Pages: 528-531
- Section: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/207734
- DOI: https://doi.org/10.1134/S1063785018060202
- ID: 207734
Cite item
Abstract
We describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of direct-current magnetron sputtering. It is suggested to optimize the substrate position with respect to magnetron and consider the floating potential to which the substrate is charged in magnetron discharge plasma as one of the main technological parameters. Electrondiffraction study of the structural characteristics of the obtained ZnO films showed that increase in the substrate temperature was accompanied by transformation of the crystallite shape from platelike to columnar.
About the authors
A. M. Ismailov
Dagestan State University
Author for correspondence.
Email: egdada@mail.ru
Russian Federation, Makhachkala, Dagestan, 367000
L. L. Emiraslanova
Dagestan State University
Email: egdada@mail.ru
Russian Federation, Makhachkala, Dagestan, 367000
M. Kh. Rabadanov
Dagestan State University
Email: egdada@mail.ru
Russian Federation, Makhachkala, Dagestan, 367000
M. R. Rabadanov
Dagestan State University
Email: egdada@mail.ru
Russian Federation, Makhachkala, Dagestan, 367000
I. Sh. Aliev
Dagestan State University
Email: egdada@mail.ru
Russian Federation, Makhachkala, Dagestan, 367000