Specific features of proton interaction with transistor structures having a 2D AlGaN/GaN channel
- Autores: Emtsev V.1, Zavarin E.1, Kozlovskii M.1, Kudoyarov M.1, Lundin V.1, Oganesyan G.1, Petrov V.1, Poloskin D.1, Sakharov A.1, Troshkov S.1, Shmidt N.1, V’yuginov V.2, Zybin A.2, Parnes Y.2, Vidyakin S.3, Gudkov A.3, Chernyakov A.4, Kozlovskii V.5
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Afiliações:
- Ioffe Physical Technical Institute
- Svetlana-Elektronpribor Company
- Bauman Moscow State Technical University
- Submicron Heterostructures for Microelectronics Research and Engineering Center
- Peter the Great St. Petersburg Polytechnic University
- Edição: Volume 42, Nº 11 (2016)
- Páginas: 1079-1082
- Seção: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/201884
- DOI: https://doi.org/10.1134/S1063785016110031
- ID: 201884
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Resumo
It has been shown that the interaction of 1 MeV protons at doses of (0.5–2) × 1014 cm–2 with transistor structures having a 2D AlGaN/GaN channel (AlGaN/GaN HEMTs) is accompanied not only by the generation of point defects, but also by the formation of local regions with a disordered nanomaterial. The degree of disorder of the nanomaterial was evaluated by multifractal analysis methods. An increase in the degree of disorder of the nanomaterial, manifested the most clearly at a proton dose of 2 × 1014 cm–2, leads to several-fold changes in the mobility and electron density in the 2D channel of HEMT structures. In this case, the transistors show a decrease in the source–drain current and an order-of-magnitude increase in the gate leakage current. In HEMT structures having an enhanced disorder of the nanomaterial prior to exposure to protons, proton irradiation results in suppression of the 2D conductivity in the channel and failure of the transistors, even at a dose of 1 × 1014 cm–2.
Sobre autores
V. Emtsev
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
E. Zavarin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
M. Kozlovskii
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
M. Kudoyarov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. Lundin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
G. Oganesyan
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. Petrov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
D. Poloskin
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Sakharov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
S. Troshkov
Ioffe Physical Technical Institute
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
N. Shmidt
Ioffe Physical Technical Institute
Autor responsável pela correspondência
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. V’yuginov
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
A. Zybin
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
Ya. Parnes
Svetlana-Elektronpribor Company
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
S. Vidyakin
Bauman Moscow State Technical University
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, Moscow, 105005
A. Gudkov
Bauman Moscow State Technical University
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, Moscow, 105005
A. Chernyakov
Submicron Heterostructures for Microelectronics Research and Engineering Center
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 194021
V. Kozlovskii
Peter the Great St. Petersburg Polytechnic University
Email: Natalia.Shmidt@mail.ioffe.ru
Rússia, St. Petersburg, 195251