The Effect of Dose of Nitrogen-Ion Implantation on the Concentration of Point Defects Introduced into GaAs Layers
- Authors: Sobolev N.A.1, Ber B.Y.1, Kazantsev D.Y.1, Kalyadin A.E.1, Karabeshkin K.V.1, Mikoushkin V.M.1, Sakharov V.I.1, Serenkov I.T.1, Shek E.I.1, Sherstnev E.V.1, Shmidt N.M.1
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Affiliations:
- Ioffe Physical Technical Institute
- Issue: Vol 44, No 7 (2018)
- Pages: 574-576
- Section: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/207773
- DOI: https://doi.org/10.1134/S1063785018070131
- ID: 207773
Cite item
Abstract
Secondary-ion mass spectrometry and Rutherford proton backscattering have been used to measure the concentration profiles of nitrogen atoms and examine the defect structure of epitaxial GaAs layers implanted with 250-keV N+ ions at doses of 5 × 1014–5 × 1016 cm–2. It was found that no amorphization of the layers being implanted occurs at doses exceeding the calculated amorphization threshold, a concentration of point defects that is formed is substantially lower than the calculated value, and a characteristic specific feature of the defect concentration profiles is the high defect concentration in the surface layer.
About the authors
N. A. Sobolev
Ioffe Physical Technical Institute
Author for correspondence.
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
B. Ya. Ber
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
D. Yu. Kazantsev
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
A. E. Kalyadin
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
K. V. Karabeshkin
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
V. M. Mikoushkin
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
V. I. Sakharov
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
I. T. Serenkov
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
E. I. Shek
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
E. V. Sherstnev
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021
N. M. Shmidt
Ioffe Physical Technical Institute
Email: nick@sobolev.ioffe.rssi.ru
Russian Federation, St. Petersburg, 194021