Formation of ordered nano- and mesostructures in silicon irradiated with a single femtosecond laser pulse in different environments
- Authors: Romashevskiy S.A.1,2, Ashitkov S.I.1, Dmitriev A.S.2
- 
							Affiliations: 
							- Joint Institute for High Temperatures
- National Research University “Moscow Power Engineering Institute,”
 
- Issue: Vol 42, No 8 (2016)
- Pages: 810-813
- Section: Article
- URL: https://journals.rcsi.science/1063-7850/article/view/200431
- DOI: https://doi.org/10.1134/S1063785016080150
- ID: 200431
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Abstract
We report on a new class of ordered nano- and mesostructures, including distinct structured areas with subnanoscale roughness, produced by interaction of single tightly focused femtosecond laser pulses with a monocrystalline silicon surface under different environments. The environment was found to have a significant effect on the final morphology of near-surface layers of silicon.
About the authors
S. A. Romashevskiy
Joint Institute for High Temperatures; National Research University “Moscow Power Engineering Institute,”
							Author for correspondence.
							Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 125412; Moscow, 111250						
S. I. Ashitkov
Joint Institute for High Temperatures
														Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 125412						
A. S. Dmitriev
National Research University “Moscow Power Engineering Institute,”
														Email: sa.romashevskiy@gmail.com
				                					                																			                												                	Russian Federation, 							Moscow, 111250						
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